SWHL GmbH

Revolutionary lithography for 3D structures

SWHL GmbH develops Sub-Wavelength Holographic Lithography (SWHL) - a disruptive lithography technology enabling production of electronic circuits at much lower costs. The technology permits printing of 3D structures with one mask in a single exposure instead of 3 - 5 masks and exposures.
SWHL GmbH is based at EMPA and is supported by strategic partners Fraunhofer (ENAS), EMPA, Swiss National Supercomputing Center, PSI and LETI.
The technology is protected with 7 granted US patents.
SWHL GmbH has proven the technological concept experimentally.
Prototype of a Holographic Stepper for 3D imaging was built. Started design of the first holographic stepper.
Funding so far: founder, EMPA.
Innosuisse grant for R&D project with EMPA confirmed.

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01.03.2024

EU grant received

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