Eulitha AG
High-quality nanostructures using advanced lithography techniques
EULITHA was founded in 2006 in the canton Aargau of Switzerland. Its founders have led the development of Extreme Ultraviolet Interference Technology at the Paul Scherrer Institute. Having entered the market with products based on its EUV technology, Eulitha has expanded its range of products with the addition of sate-of-the-art electron beam lithography technology to its capabilities. In 2010, Eulitha announced the breakthrough PHABLE™ technology, which greatly simplifies production of periodic nanostructures over wafer scale areas. The company has a global customer base of researchers from industrial and academic laboratories. Backed by private Swiss equity Eulitha serves its growing number of customers from two locations at the TECHNOPARK® Aargau and the Paul Scherrer Institute.
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06.07.2022
AGIC Capital backs Eulitha’s global development (startupticker.ch)
28.12.2018
EULITHA delivers its first new exposure tool to PSI (startupticker.ch)
12.01.2015
Eulitha delivers PhableR 100 photolithography system to China production company (startupticker.ch)
27.11.2013
Eulitha’s technology for volume production of LED enters the market (startupticker.ch)
05.04.2012
Eulitha wins backing from SVC - Ltd. for Risk Capital for SMEs (startupticker.ch)
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Eulitha AG
High-quality nanostructures using advanced lithography techniques
Website:
www.eulitha.com
Headquarter:
Villigen
Foundation Date:
March 2006
Technology:
- Engineering
Sectors:
- Micro technologies
- Nano technologies